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Passivating thin bifacial silicon solar cells for industrial production
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2007 (English)In: Progress in Photovoltaics, ISSN 1062-7995, E-ISSN 1099-159X, Vol. 15, no 6, 469-475 p.Article in journal (Refereed) Published
Abstract [en]

A scheme for passivating thin multi-crystalline silicon solar cells compatible to massproduction is presented. Wafers with a thickness of 180 mm were processed into solarcells. The otherwise severe bowing has been avoided by reduced aluminium coverageon the rear surface. The process scheme includes a silicon nitride firing through stepfor conventional screen printed contacts, where a silicon nitride layer on the rearsurface acts as surface passivation layer and enables a gain in efficiency of 0.6%[abs.].

Place, publisher, year, edition, pages
2007. Vol. 15, no 6, 469-475 p.
Keyword [en]
silicon solar cell surface passivation PECVD
National Category
Condensed Matter Physics
Research subject
URN: urn:nbn:se:kau:diva-27903DOI: 10.1002/pip.750OAI: diva2:628893
Available from: 2013-06-14 Created: 2013-06-14 Last updated: 2015-09-17Bibliographically approved

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Rinio, Markus
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