Passivating thin bifacial silicon solar cells for industrial production
2007 (English)In: Progress in Photovoltaics, ISSN 1062-7995, E-ISSN 1099-159X, Vol. 15, no 6, 469-475 p.Article in journal (Refereed) Published
A scheme for passivating thin multi-crystalline silicon solar cells compatible to massproduction is presented. Wafers with a thickness of 180 mm were processed into solarcells. The otherwise severe bowing has been avoided by reduced aluminium coverageon the rear surface. The process scheme includes a silicon nitride firing through stepfor conventional screen printed contacts, where a silicon nitride layer on the rearsurface acts as surface passivation layer and enables a gain in efficiency of 0.6%[abs.].
Place, publisher, year, edition, pages
2007. Vol. 15, no 6, 469-475 p.
silicon solar cell surface passivation PECVD
Condensed Matter Physics
Research subject Physics
IdentifiersURN: urn:nbn:se:kau:diva-27903DOI: 10.1002/pip.750OAI: oai:DiVA.org:kau-27903DiVA: diva2:628893