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Initial oxidation process of a Si(111)-(7x7) surface studied by photoelectron spectroscopy
Karlstad University, Faculty of Technology and Science, Department of Physics and Electrical Engineering. (Materialvetenskap)ORCID iD: 0000-0003-4165-1515
2004 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 464-465, 10-13 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
Elsevier, 2004. Vol. 464-465, 10-13 p.
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Physical Sciences
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Physics
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URN: urn:nbn:se:kau:diva-20396DOI: 10.1016/j.tsf.2004.06.038OAI: oai:DiVA.org:kau-20396DiVA: diva2:594056
Available from: 2013-01-21 Created: 2013-01-21 Last updated: 2015-07-31Bibliographically approved

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CiteExportLink to record
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