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Characterization of X-ray induced damage in alkanethiolate monolayers by high resolution photoelectron spectroscopy,
Karlstad University, Faculty of Technology and Science, Department of Physics and Electrical Engineering. Karlstad University, Faculty of Technology and Science, Materials Science.
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2001 (English)In: Langmuir 17, 8 (2001)Article in journal (Refereed)
Abstract [en]

Synchrotron-based high-resolution X-ray photoelectron spectroscopy was for the first time applied to investigate the damage in self-assembled monolayers (SAMs) of alkanethiols (AT) on Au caused by soft X-rays. The observed changes in AT SAMs and, in particular, the appearance of a new, irradiation-induced sulfur species are identical to those caused by electron bombardment, implying that most of the damage is produced by the photoelectrons and secondary electrons. The irradiation-induced sulfur species is identified as a dialkyl sulfide distributed within the AT film. Only minutes of monochromatized X-ray irradiation at an undulator beamline destroys the AT adlayer completely.

Place, publisher, year, edition, pages
2001.
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Physical Sciences
Research subject
Physics
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URN: urn:nbn:se:kau:diva-17649OAI: oai:DiVA.org:kau-17649DiVA, id: diva2:591260
Available from: 2013-01-21 Created: 2013-01-21 Last updated: 2013-01-21

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