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Boron impurity at the Si/SiO_{2} interface in SOI wafers and consequences for piezoresistive MEMS devices
Karlstad University, Faculty of Technology and Science, Department of Physics and Electrical Engineering. Karlstad University, Faculty of Technology and Science, Materials Science.ORCID iD: 0000-0003-1711-5595
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2009 (English)In: Journal of Micromechanics and Microengineering, ISSN 0960-1317, E-ISSN 1361-6439, Vol. 19, no 1, 1-6 p.Article in journal (Refereed)
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2009. Vol. 19, no 1, 1-6 p.
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Physical Sciences
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Physics
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URN: urn:nbn:se:kau:diva-9819OAI: oai:DiVA.org:kau-9819DiVA: diva2:493326
Available from: 2012-02-08 Created: 2012-02-08 Last updated: 2014-10-28Bibliographically approved

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Svensson, Krister

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