This study is focused on how the application of pulsed substrate bias during cathodic arc deposition affects the microstructure, texture, grain size and phase composition of (Ti,Al)N coatings. A series of Tix-1AlxN, 0.25≤x≤0.55 coatings were deposited on WC-Co cemented carbide substrates with -30 V, -60 V and -300 V pulsing bias (duty cycle 10 % and a frequence of 1 kHz) under controlled chamber conditions at 4.5 Pa N2-gas and a substrate temperature about 400 °C. The pulsing parameters for the bias (voltage, duty cycle and frequency) were deliberately selected to influence structure, microstructure and composition of the deposited coatings. All Tix-1AlxN coatings had a consistent columnar cubic B1 structure regardless of their chemical composition. Coatings grown at -30 V and -60 V pulsed bias exhibited a pronounced <111> texture attributed to a kinetically driven mechanism influenced by the relative flux of ion species, affecting the surface migration of adatoms during growth. In contrast, the coatings grown with a pulsed bias of -300 V exhibited a reduced <111> texture and the onset of grains with <100> preferred orientation. The transition to the <100> orientation with increased ion energy agrees with the fact that the <111> directions expose the densest array of atoms to the ion beam during growth while the <100> are the most open channeling directions in a B1 structure. The correlation to the preferred with respect to pulsing conditions during growth, correlated to microstructure, grain size and phase composition be further discussed. Surface roughness was highest (Sa≈0.17-0.22 µm) for coating deposited at pulsed bias -30 V.