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Enhancing corrosion resistance, hardness, and crack resistance in magnetron sputtered high entropy CoCrFeMnNi coatings by adding carbon
Uppsala University, Sweden.
Uppsala University, Sweden.ORCID iD: 0000-0002-0491-1077
Uppsala University, Sweden.
Royal Institute of Technology (KTH), Sweden.
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2021 (English)In: Materials & design, ISSN 0264-1275, E-ISSN 1873-4197, Vol. 205, article id 109711Article in journal (Refereed) Published
Abstract [en]

This study explores carbon addition as a materials design approach for simultaneously improving the hardness, crack resistance, and corrosion resistance of high entropy thin films. CoCrFeMnNi was selected as a starting point, due to its high concentration of weak carbide formers. The suppression of carbides is crucial to the approach, as carbide formation can decrease both ductility and corrosion resistance. Films with 0, 6, and 11 at.% C were deposited by magnetron co-sputtering, using a graphite target and a sintered compound target. The samples with 0 at.% C crystallized with a mixture of a cubic closed packed (ccp) phase and the intermetallic χ-phase. With 6 and 11 at.% C, the films were amorphous and homogenous down to the nm-scale. The hardness of the films increased from 8 GPa in the carbon-free film to 16 GPa in the film with 11 at.% C. Furthermore, the carbon significantly improved the crack resistance as shown in fragmentation tests, where the crack density was strongly reduced. The changes in mechanical properties were primarily attributed to the shift from crystalline to amorphous. Lastly, the carbon improved the corrosion resistance by a progressive lowering of the corrosion current and the passive current with increasing carbon concentration.

Place, publisher, year, edition, pages
Elsevier, 2021. Vol. 205, article id 109711
Keywords [en]
Thin film, Magnetron sputtering, Corrosion, Fragmentation test, Amorphous alloys, Bipolar plate
National Category
Materials Engineering
Research subject
Construction Engineering
Identifiers
URN: urn:nbn:se:kau:diva-96510DOI: 10.1016/j.matdes.2021.109711ISI: 000659520300002Scopus ID: 2-s2.0-85105693059OAI: oai:DiVA.org:kau-96510DiVA, id: diva2:1792169
Available from: 2023-08-28 Created: 2023-08-28 Last updated: 2023-08-31Bibliographically approved

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Tavares da Costa, Marcus V.

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